ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,278, issued on April 21, was assigned to NuFlare Technology Inc. (Yokohama, Japan). "Multi charged particle beam writing method and multi ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,279, issued on April 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "In-situ ion beam angle measurement" was invented b... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,280, issued on April 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Substrate stress management using variable energy ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,281, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Filament alignment device" was invented by... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,282, issued on April 21, was assigned to Carl Zeiss MultiSEM GmbH (Oberkochen, Germany). "Multi-beam charged particle system and method of... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,283, issued on April 21, was assigned to Lam Research Corp. (Fremont, Calif.). "Control of pulsing frequencies and duty cycles of paramete... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,284, issued on April 21, was assigned to Lam Research Corp. (Fremont, Calif.). "Adjustment of power and frequency based on three or more s... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,285, issued on April 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Semiconductor manufacturing apparatus and manufacturing method for ... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,286, issued on April 21, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Protection treatments for surfaces of semiconducto... Read More
ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,287, issued on April 21, was assigned to Tokyo Electron Ltd. (Tokyo). "Method for etching film and plasma processing apparatus" was invent... Read More